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The plasma production and extraction, which is used by IPT, make use of the patented methods for ion extraction and can be used in a variety of applications. Our capacity coupled plasma beam sources can be used in CVD processes as well as for plasma beam support in common PVD processes. The energy area suffices of typical 30eV to 800eV. By an inductive RF coupling plasmas are produced with very high ionization degrees. Arbitrary beam geometries are conceivable. Preferentially finds this manner the plasma generation in the ion beam technologies application. The energy area of such an ion beam application lies here typically between 100eV to 5 keV. |
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