1993 foundation as a “start up” of the University of Kaiserslautern   1994 production of the worldwide first plasma beam source with a neutral plasma beam;           Work principle: „Self-biasing-effect“ of Prof. Dr. Hans Oechsner   1996 first attempts to the industrial coating of extremist thin carbon layers by means of           plasma beam sources (PE-CVD process)   1998 new concept of inductively coupled RF ion sources with variable beam geometry           (Cyclotron Wave Resonance); First linear ion source           with a 30cm beam geometry and a 3-grid extraction system   1999 association with the Jakob-Group and amplified cooperation with Jakob Vakuumtechnik (JVT)   2000 project start for the development of new sensors for the gas analysis   2001 first 1 meter ion source for coating SiO2 layers for an industrial production           of gassensormikroarrays   2002 transfer of the company to the corporate centre at Kleinwallstadt; this one further intensified           cooperation with Jakob Vakuumtechnik   2003 start to refit the Circulus machines M12 / M14 with C-Guns for the production of thin carbon layers   2004 production of the first industrial plant for the production of mikroarrays for the gas analysis   2005 worldwide refitting of the Circulus systems for thin carbon layers           by PBS plasma beam sources; further development of plasma sources to the ion support           in the high vacuum optical coating machines by means of fluorine substances for the           DUV/VUV area of 193nm   2006 further development of the plasma beam sources for linear system; patent applications   2007 reorientation of the company for beam analyses with microsystem technology