Every line of business has its own needs which require user-specific solutions. Our ion beam sources can be adapted special according to the respective requirements on the wishes of our customers. The challenges arising from it always open up new horizons in thin layer technology.

Fields of application ion beam sources:

Pre-cleaning and activation of surfaces Sputter processes also with reactive gases Bring in atoms from outside to the surface (Doting) Plasma supported PVD processes IBAD (Ion Beam Assisted Deposition)

Product specification WRS:

New possibilities discover means "with innovation" in the future. The ion beam source type WRS puts new standards in the field of the surface processing.   The patented principle of the inductive RF allows optimal plasma coupling with arbitrary beam geometries. This source type also convinced by the combination from long time process stability and maintenance liberty. Work with reactive gasses is also more distant possibly..