Middle of 1990 the development of a new source for the deposition of ultra thin diamond like carbon overcoat starts. Thanks to the innovation strength of our scientists and engineers a very robust and efficient source which is usable in all areas of the modern thin layer technology has arisen from this.

Fields of application plasma beam sources:

Production of extremist thin carbon layers (DLC layers) Pre-cleaning and activation of surfaces Reaktive gas processes for visual applications Deposition of layer systems of the gaseous phase (PECVD) Plasma support for all common PVD methods (e.g. Sputter processes, Arc evaporation, electron beam evaporation)

Product specification PBS:

The plasma beam sources type PBS offer you everything you expect from a modern beam source. It is low-maintenance further for developed beam sources and stand out due to their long process stand times. The filamentless plasma creation makes the operation of the source possible with Inert and reactive gases. The plasma beam source works on the the patented method of beam extraction which produces a neutral plasma beam. An expensive after-neutralization is therefore dropped. The energy in the beam can be regulated by the RF power. If it is about the optimal one coupling of the RF performance in the process, a Matching tuning automatically is prerequisite. This pluggable Automatching was developed and coordinated especially for the source type PBS. It has two vacuum capacitors and finds the respective operating point automatically. Through this the optimal performance is always reached for its process. .