Physical process by which atoms or molecules are sprayed out from solid materials only by ion bombardment with high energetic ions. This ions change from solid phase (into the subtract material) to the gas phase.   Used methods are:   IE = Ion Etching Inert ions will be accelerated to the substrate Substrate in contact with the plasma   IBE = Ion Beam Etching Inert ions, which are accelerated by an ion beam source, are used Substrate not in contact with the plasma   RIE = Reaktive Ion Etching Etching with reactive ions Substrate in contact with the plasma   RIBE = Reaktive Ion Beam Etching Reactive ions, which are accelerated by an ion beam source, are used Substrate not in contact with the plasma   PE = Plasma Etching Chemical Etching with free radicals and less support of free ions.   BE = Barrel Etching Chemical Etching only by the use of free radicals